Eulitha’s technology for volume production of LED enters the market

27.11.2013 08:23

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, introduced the EVG PHABLE exposure system, which is designed specifically for cost-efficient volume production of photonic components. The system features technology from Eulitha AG, a spin-off company of the Paul Scherrer Institute.

The EVG PHABLE system incorporates a unique contactless lithography mask-based approach that enables full-field, high-resolution and cost-efficient micro- and nanopatterning of passive and active photonic components, such as patterned structures on light emitting diode (LED) wafers, in high-throughput production environments.

The EVG PHABLE exposure system is the first fully-automated production equipment to feature PHABLE (“photonics enabler”) technology from Eulitha AG, a pioneer in lithography tools based in Villigen PSI, Switzerland. Integrating Eulitha's full-field exposure technology with EVG's well-established nanolithography production platform provides a unique solution for the automated fabrication of photonic nanostructures.

The EVG PHABLE system combines the low cost-of-ownership, ease-of-use and non-contact capabilities of proximity lithography with the sub-micron resolution of lithography steppers to provide low-cost automated fabrication of photonic patterns over large areas. This makes it ideally suited for patterned sapphire substrates (PSS) or to enhance the light extraction (and thus the efficiency) of LED devices.

“We are excited to enter the commercialization phase of our collaboration with Eulitha,” stated Hermann Waltl, executive sales and customer support director at EV Group. “The EVG PHABLE system broadens EVG’s micro- and nanopatterning process portfolio, providing a unique, very cost-efficient solution to our customers in the LED, optics and photonics markets. The novel equipment clearly demonstrates the synergies of our respective technologies.”

Eulitha AG is a spin-off company of the Paul Scherrer Institute, Switzerland. It specializes in the development of innovative lithographic technologies for applications in optoelectronics, photonics, biotechnology, and data storage. In 2010, Eulitha announced the breakthrough PHABLE technology, which greatly simplifies production of periodic nanostructures over wafer scale areas. The company has a global customer base of researchers from industrial and academic laboratories. Backed by private Swiss equity Eulitha serves its growing number of customers from two locations at the TECHNOPARK Aargau and the Paul Scherrer Institute.

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